• DocumentCode
    1958701
  • Title

    Silicon waveguide infrared photodiodes based on embedded nickel silicide particles

  • Author

    Zhu, Shiyang ; Lo, G.Q. ; Kwong, D.L. ; Chu, H.S. ; Bai, P. ; Li, E.P.

  • Author_Institution
    Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
  • fYear
    2012
  • fDate
    4-8 March 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    A novel CMOS-compatible infrared Si-waveguide photodetector, which utilizes photoemission from electrically floating metal silicide nanoparticles embedded in the space charge region of a Si p-n junction, is proposed. Numerical simulations show that absorption of infrared radiation in the particles can be dramatically enhanced due to resonant excitation of the localized surface plasmons on the particles, thus enabling to shrink the detector´s footprint to a submicron scale. A proof-of-concept device is fabricated using standard CMOS technology, exhibiting a peak responsivity of ~30 mA/W and a 3-dB bandwidth of ~6 GHz.
  • Keywords
    CMOS integrated circuits; infrared detectors; nanoparticles; nickel compounds; optical waveguides; photodetectors; photodiodes; plasmonics; silicon; surface plasmons; NiSi; Si; Si p-n junction; infrared Si-waveguide photodetector; infrared radiation; localized surface plasmons; metal silicide nanoparticles; nickel silicide particles; silicon waveguide infrared photodiodes; standard CMOS technology; Absorption; Dark current; Detectors; Nanoparticles; Optical waveguides; Silicides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communication Conference and Exposition (OFC/NFOEC), 2012 and the National Fiber Optic Engineers Conference
  • Conference_Location
    Los Angeles, CA
  • ISSN
    pending
  • Print_ISBN
    978-1-4673-0262-3
  • Type

    conf

  • Filename
    6192060