DocumentCode
1958701
Title
Silicon waveguide infrared photodiodes based on embedded nickel silicide particles
Author
Zhu, Shiyang ; Lo, G.Q. ; Kwong, D.L. ; Chu, H.S. ; Bai, P. ; Li, E.P.
Author_Institution
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
fYear
2012
fDate
4-8 March 2012
Firstpage
1
Lastpage
3
Abstract
A novel CMOS-compatible infrared Si-waveguide photodetector, which utilizes photoemission from electrically floating metal silicide nanoparticles embedded in the space charge region of a Si p-n junction, is proposed. Numerical simulations show that absorption of infrared radiation in the particles can be dramatically enhanced due to resonant excitation of the localized surface plasmons on the particles, thus enabling to shrink the detector´s footprint to a submicron scale. A proof-of-concept device is fabricated using standard CMOS technology, exhibiting a peak responsivity of ~30 mA/W and a 3-dB bandwidth of ~6 GHz.
Keywords
CMOS integrated circuits; infrared detectors; nanoparticles; nickel compounds; optical waveguides; photodetectors; photodiodes; plasmonics; silicon; surface plasmons; NiSi; Si; Si p-n junction; infrared Si-waveguide photodetector; infrared radiation; localized surface plasmons; metal silicide nanoparticles; nickel silicide particles; silicon waveguide infrared photodiodes; standard CMOS technology; Absorption; Dark current; Detectors; Nanoparticles; Optical waveguides; Silicides; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communication Conference and Exposition (OFC/NFOEC), 2012 and the National Fiber Optic Engineers Conference
Conference_Location
Los Angeles, CA
ISSN
pending
Print_ISBN
978-1-4673-0262-3
Type
conf
Filename
6192060
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