• DocumentCode
    1959633
  • Title

    Plasma lithography for control of cell morphology and proliferation

  • Author

    Junkin, Michael ; Zhang, Donna D. ; Pak Kin Wong

  • Author_Institution
    Aerosp. & Mech. Eng. Dept., Univ. of Arizona, Tucson, AZ
  • fYear
    2009
  • fDate
    5-8 Jan. 2009
  • Firstpage
    822
  • Lastpage
    826
  • Abstract
    We have utilized a plasma based patterning technique, that we have developed, to study the effects of micrometer and submicrometer scale surface functionalization on cell proliferation and morphology. We have applied this method to cellular patterning and examined the response of mammalian cells to patterns of hydrophobic and hydrophilic areas created directly on polystyrene substrates. We have observed that the residual plasma pattern can serve as a template for cell attachment and growth on patterns at line widths ~22 mum and larger. At smaller sizes, cells do not align themselves with the pattern, but their growth is affected and is significantly less than on homogeneous hydrophilic polystyrene surfaces. This type of patterning could have several uses including tissue engineering, medical implants, or providing a means for studying the fundamental behavior of cell to surface and other interactions.
  • Keywords
    cellular biophysics; hydrophilicity; hydrophobicity; lithography; plasma applications; prosthetics; tissue engineering; cell attachment; cell morphology; cell proliferation; cellular patterning; hydrophilic areas; hydrophobic areas; mammalian cells; medical implants; patterning; plasma lithography; polystyrene substrates; residual plasma pattern; surface functionalization; tissue engineering; Biological materials; Chemicals; Implants; Lithography; Plasma applications; Plasma chemistry; Surface morphology; Surface topography; Tissue engineering; USA Councils; Cellular patterning; Plasma lithography; Surface patterning; Tissue engineering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
  • Conference_Location
    Shenzhen
  • Print_ISBN
    978-1-4244-4629-2
  • Electronic_ISBN
    978-1-4244-4630-8
  • Type

    conf

  • DOI
    10.1109/NEMS.2009.5068703
  • Filename
    5068703