• DocumentCode
    1962566
  • Title

    Temperature-dependent Behaviors of the Surface Plasmon Coupling with an InGaN/GaN Quantum Well

  • Author

    Lu, Yen-Cheng ; Chen, Cheng-Yen ; Yeh, Dong-Ming ; Huang, Chi-Feng ; Tang, Tsung-Yi ; Huang, Jeng-Jie ; Yang, C.C.

  • Author_Institution
    Nat. Taiwan Univ., Taipei
  • fYear
    2007
  • fDate
    Aug. 12 2007-July 16 2007
  • Firstpage
    127
  • Lastpage
    128
  • Abstract
    We demonstrate the temperature dependent behavior of the surface plasmon (SP) coupling with an InGaN/GaN quantum well (QW). The SP coupling efficiency relies on the availability of carriers with sufficient momentum for transferring the energy and momentum into the SP modes. At low temperatures, the carriers are trapped by the potential minima in the QW and the SP coupling is weak. As temperature increases, more and more carriers escape from the potential minima leading to the stronger and stronger SP coupling. When the temperature is close to the room condition, the SP coupling strength saturates because most carriers have escaped from the potential minima. The three temperature ranges of different SP coupling behaviors can be clearly identified from the data of photoluminescence (PL) enhancement ratio and PL intensity decay rate.
  • Keywords
    III-V semiconductors; gallium compounds; indium compounds; photoluminescence; semiconductor quantum wells; surface plasmons; wide band gap semiconductors; InGaN-GaN; InGaN-GaN - Interface; InGaN-GaN - System; coupling efficiency; photoluminescence enhancement ratio; photoluminescence intensity decay rate; potential minima; quantum well; surface plasmon; Chemical vapor deposition; Excitons; Gallium nitride; Kelvin; Optical coupling; Optical propagation; Photoluminescence; Plasmons; Temperature dependence; Temperature distribution; InGaN/GaN; quantum well; surface plasmon; temperature-dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
  • Conference_Location
    Hualien
  • Print_ISBN
    978-1-4244-0641-8
  • Type

    conf

  • DOI
    10.1109/OMEMS.2007.4373873
  • Filename
    4373873