• DocumentCode
    1962594
  • Title

    Automated extraction of capacitances and electrostatic forces in MEMS and ULSI interconnects from the mask layout

  • Author

    Bachtold, M. ; Taschini, S. ; Korvink, J.G. ; Baltes, H.

  • Author_Institution
    Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland
  • fYear
    1997
  • fDate
    10-10 Dec. 1997
  • Firstpage
    129
  • Lastpage
    132
  • Abstract
    Efficient and accurate electrostatic simulations are required for extracting capacitance values and electrostatic forces in the design of MEMS actuators and ULSI interconnects. Typical simulations involve complex 3D geometries and various boundary conditions. The simulation of such devices involves the time-consuming and error-prone specification of the geometry, the construction of a 3D mesh suited to numerical computation, and an efficient and accurate electrostatic simulation engine. In this paper, we present a fully automated approach to electrostatic device characterization, using the mask layout and a process description as the input for the geometry definition. The presented solution allows one to perform automated electrostatic parameter extraction while requiring only minimal user interaction and also provides an estimation of the accuracy of the computed result.
  • Keywords
    ULSI; capacitance; digital simulation; electrostatics; integrated circuit interconnections; masks; microactuators; MEMS; ULSI interconnects; actuators; automated electrostatic parameter extraction; boundary conditions; capacitance; complex 3D geometries; electrostatic forces; electrostatic simulations; geometry definition; mask layout; process description; Boundary conditions; Capacitance; Computational geometry; Computational modeling; Electrostatic actuators; Electrostatic devices; Engines; Micromechanical devices; Solid modeling; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-4100-7
  • Type

    conf

  • DOI
    10.1109/IEDM.1997.650216
  • Filename
    650216