DocumentCode
1964530
Title
Device-conscious circuit designs for 0.5-V high-speed memory-rich nanoscale CMOS LSIs
Author
Kotabe, Akira ; Itoh, Kiyoo ; Takemura, Riichiro ; Tsuchiya, Ryuta ; Horiguchi, Masashi
Author_Institution
Central Res. Lab., Hitachi, Ltd., Tokyo, Japan
fYear
2011
fDate
19-21 Sept. 2011
Firstpage
1
Lastpage
7
Abstract
The feasibility of 0.5-V memory-rich nanoscale CMOS LSIs was studied. First, repair techniques and nanoscale FD-SOI MOSTs are discussed in terms of Vt-variation. Second, sub-0.5-V dual-VDD dual-Vt logic circuits are proposed and evaluated by simulation with a 25-nm planar FD-SOI MOST, followed by an investigation of a 0.5-V 1-Gb SRAM/DRAM. Third, the importance of using compensation circuits for process, voltage, and temperature variations is stressed. Finally, it is concluded that a 0.5-V memory-rich CMOS LSI is possible while reducing the power to one-tenth that of a conventional 1-V CMOS LSI if the above devices and circuits are used and the within-wafer Vt-variation is compensated for.
Keywords
CMOS memory circuits; DRAM chips; SRAM chips; integrated circuit design; integrated circuit manufacture; large scale integration; silicon-on-insulator; DRAM; SRAM; device conscious circuit designs; high speed memoryrich nanoscale CMOS LSI; logic circuits; memory size 1 GByte; planar FD-SOI MOST; process variation; size 25 nm; temperature variation; voltage 0.5 V; voltage variation; CMOS integrated circuits; Capacitance; FinFETs; Logic circuits; Logic gates; Maintenance engineering; Random access memory;
fLanguage
English
Publisher
ieee
Conference_Titel
Custom Integrated Circuits Conference (CICC), 2011 IEEE
Conference_Location
San Jose, CA
ISSN
0886-5930
Print_ISBN
978-1-4577-0222-8
Type
conf
DOI
10.1109/CICC.2011.6055313
Filename
6055313
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