• DocumentCode
    1971050
  • Title

    Optimized Si/SiGe notched gates for CMOS

  • Author

    Monfray, S. ; Julien, C. ; Ribot, P. ; Boeuf, F. ; Dutartre, D. ; Martins, J. ; Sondergard, E. ; Skotnicki, T.

  • Author_Institution
    France Telecom, Crolles, France
  • fYear
    2001
  • fDate
    11-13 September 2001
  • Firstpage
    275
  • Lastpage
    278
  • Keywords
    Amorphous materials; Etching; Germanium silicon alloys; MOS devices; Measurement standards; Performance evaluation; Plasma applications; Plasma materials processing; Silicon germanium; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2001. Proceeding of the 31st European
  • Print_ISBN
    2-914601-01-8
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2001.195254
  • Filename
    1506636
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1971050