DocumentCode
1972255
Title
Device degradation models for circuit reliability simulation
Author
Sasse, Guido
Author_Institution
NXP Semiconductors Gertstweg 2, Nijmegen, 6534AE, The Neitherlands
fYear
2013
fDate
13-17 Oct. 2013
Firstpage
42
Lastpage
42
Abstract
With reliability margins shrinking, it is increasingly important to carefully assess the impact of device degradation during circuit design. Circuit reliability simulation is a very useful tool for this purpose as it allows designers to guarantee that circuits are sufficiently robust against device degradation, while they are not bound by overly robust design rules. Hence its usage is becoming more and more widely adopted in mixed signal circuit design. Various degradation mechanisms can be evaluated using circuit reliability simulation including hot carrier degradation, NBTI, PBTI as well as TDDB. In this paper I will present the underlying models that are available to describe device degradation as a function of stress conditions. I will explain the methodology used for translating DC degradation models to the time varying stress signals encountered in actual circuits as well as the justification and the limitations of adopting this approach. I will discuss standard CMOS as well as bipolar and DMOS transistors.
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report (IRW), 2013 IEEE International
Conference_Location
South Lake Tahoe, CA, USA
ISSN
1930-8841
Print_ISBN
978-1-4799-0350-4
Type
conf
DOI
10.1109/IIRW.2013.6804152
Filename
6804152
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