DocumentCode
1979894
Title
Stacking of InAs/GaAs QDs with less strain by using growth interruption
Author
Saravanan, Shanmugam ; Shimizu, Hitoshi
Author_Institution
ATR Wave Eng. Lab., Kyoto
fYear
0
fDate
0-0 0
Firstpage
204
Lastpage
207
Abstract
InAs quantum dots (QDs) with less size fluctuations were obtained on GaAs (100) substrate by using the growth interruption of 15 seconds for every 0.11 ML after depositing 1.9 MLs of InAs continuously. Light emission with a wavelength of 1242 nm at room temperature from InAs QDs has been obtained. Atomic force microscopy images show that the initial continuous growth up to 1.9 MLs acted as a "seed" and helped to double the dot density. The subsequent supply of In with interruptions resulted in a large dot size while maintaining a high dot density. The six layer stacked (d = 22 nm) QDs grown with interruptions showed nearly 7 times stronger photoluminescence at room temperature than the continuously grown structure
Keywords
III-V semiconductors; atomic force microscopy; gallium arsenide; indium compounds; molecular beam epitaxial growth; photoluminescence; semiconductor growth; semiconductor quantum dots; 15 sec; 293 to 298 K; GaAs; GaAs (100) substrate; InAs-GaAs; InAs/GaAs QD stacking; InAs/GaAs quantum dot stacking; atomic force microscopy; continuously grown structure; dot density; dot size; growth interruption; light emission; molecular beam epitaxy; photoluminescence; size fluctuation; strain; Atomic force microscopy; Atomic layer deposition; Capacitive sensors; Fluctuations; Gallium arsenide; Multilevel systems; Photoluminescence; Quantum dots; Stacking; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials Conference Proceedings, 2006 International Conference on
Conference_Location
Princeton, NJ
Print_ISBN
0-7803-9558-1
Type
conf
DOI
10.1109/ICIPRM.2006.1634149
Filename
1634149
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