• DocumentCode
    1980417
  • Title

    High speed lateral trench detectors with a junction substrate

  • Author

    Qiqing Ouyang ; Schaub, J.D.

  • Author_Institution
    IBM Div. of Res., Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    2003
  • fDate
    23-25 June 2003
  • Firstpage
    73
  • Lastpage
    74
  • Abstract
    In this paper, we propose a junction-substrate LTD structure. Two-dimensional device simulations indicate that the built-in electric field created by the buried junction can effectively block the deep carriers and increase the bandwidth. The buried p-n junction can be realized by conventional techniques such as epitaxy. Preliminary experimental results show significant enhancement in bandwidths in such devices. Further device simulations show that a 50/spl mu/m diameter device can achieve a transit time limited bandwidth in excess of 10GHz with an optimized design.
  • Keywords
    electric field effects; elemental semiconductors; photodetectors; photodiodes; semiconductor device models; silicon; 10 GHz; 50 micron; Si; buried p-n junction; deep carriers; electric field; epitaxy methods; high speed lateral trench detectors; junction substrate; transit time limited bandwidth; two-dimensional device simulations; Absorption; Bandwidth; Biomedical optical imaging; Detectors; Doping; Frequency response; High speed optical techniques; Medical simulation; Research and development; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2003
  • Conference_Location
    Salt Lake City, UT, USA
  • Print_ISBN
    0-7803-7727-3
  • Type

    conf

  • DOI
    10.1109/DRC.2003.1226878
  • Filename
    1226878