DocumentCode
1981216
Title
Focused ion beam post-processing for single mode photonic crystal vertical cavity surface-emitting lasers
Author
Danner, A.J. ; Yokouchi, N. ; Raftery, J.J., Jr. ; Choquette, K.D.
Author_Institution
Univ. of Illinois, Urbana, IL, USA
fYear
2003
fDate
23-25 June 2003
Firstpage
155
Lastpage
156
Abstract
In this paper, we present the first photonic crystal VCSELs fabricated using FIBE method whereby photonic crystal holes can be etched into prefabricated VCSELs.
Keywords
focused ion beam technology; photonic crystals; silicon compounds; sputter etching; surface emitting lasers; FIB etching method; SiO/sub 2/; VCSEL; focused ion beam post-processing; photonic crystal vertical cavity surface-emitting lasers; Crystalline materials; Etching; Ion beams; Laser modes; Lattices; Optical materials; Photonic crystals; Silicon compounds; Surface emitting lasers; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 2003
Conference_Location
Salt Lake City, UT, USA
Print_ISBN
0-7803-7727-3
Type
conf
DOI
10.1109/DRC.2003.1226913
Filename
1226913
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