• DocumentCode
    1981216
  • Title

    Focused ion beam post-processing for single mode photonic crystal vertical cavity surface-emitting lasers

  • Author

    Danner, A.J. ; Yokouchi, N. ; Raftery, J.J., Jr. ; Choquette, K.D.

  • Author_Institution
    Univ. of Illinois, Urbana, IL, USA
  • fYear
    2003
  • fDate
    23-25 June 2003
  • Firstpage
    155
  • Lastpage
    156
  • Abstract
    In this paper, we present the first photonic crystal VCSELs fabricated using FIBE method whereby photonic crystal holes can be etched into prefabricated VCSELs.
  • Keywords
    focused ion beam technology; photonic crystals; silicon compounds; sputter etching; surface emitting lasers; FIB etching method; SiO/sub 2/; VCSEL; focused ion beam post-processing; photonic crystal vertical cavity surface-emitting lasers; Crystalline materials; Etching; Ion beams; Laser modes; Lattices; Optical materials; Photonic crystals; Silicon compounds; Surface emitting lasers; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2003
  • Conference_Location
    Salt Lake City, UT, USA
  • Print_ISBN
    0-7803-7727-3
  • Type

    conf

  • DOI
    10.1109/DRC.2003.1226913
  • Filename
    1226913