DocumentCode
1984260
Title
Surface treatments and photodesorption of oxygen free copper used in an accelerator
Author
Koabari, T. ; Matumoto, Manabu ; Ueda, Shinjiro ; Kobayashi, Masanori ; Hori, Yoichiro
Author_Institution
Mech. Eng. Res. Lab., Hitachi Ltd., Ibaraki, Japan
fYear
1993
fDate
17-20 May 1993
Firstpage
3903
Abstract
Test samples of machined oxygen free copper (OFC) were exposed to synchrotron radiation from the Photon Factory (PF) of KEK for a critical energy of 4 keV. In experiments, we measured the photoelectron yield and the photodesorption yield due to synchrotron radiation. The irradiated surfaces were also analyzed by AES
Keywords
Auger effect; X-ray effects; atomic emission spectroscopy; copper; desorption; photoelectron spectra; synchrotron radiation; 4 keV; AES; Cu; oxygen free copper; photodesorption yield; photoelectron yield; surface treatment; synchrotron radiation; Acceleration; Cleaning; Copper; Electrons; Laboratories; Oxygen; Production facilities; Rough surfaces; Surface treatment; Synchrotron radiation;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 1993., Proceedings of the 1993
Conference_Location
Washington, DC
Print_ISBN
0-7803-1203-1
Type
conf
DOI
10.1109/PAC.1993.309829
Filename
309829
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