DocumentCode
1987535
Title
Investigation of RF Performance of Nano-Scale Ultra-Thin-Body Schottky-Barrier MOSFETs Using Monte Carlo Simulation
Author
Xia, Zhiliang ; Du, Gang ; Liu, Xiaoyan ; Kang, Jinfeng ; Han, Ruqi
Author_Institution
Institute of Microelectronics, Peking University, Beijing 100871, P. R. China
fYear
2005
fDate
19-21 Dec. 2005
Firstpage
305
Lastpage
308
Abstract
A Monte Carlo investigation of the dynamic performance of nano-scale ultra-thin-body (UTB) Schottky-Barrier MOSFETs (SB-MOSFETs) is presented. A thorough account of how the gate voltage and SB barrier height affect the RF performance of UTB SB-MOSFETs is elaborated. The UTB SB-MOSFET offers excellent RF performance with high values of fT and fmax . The peak fT is higher than 600 GHz with SB height ranging from 0.2eV to 0.3eV. It is found that gate voltage has a significant influence on fT and fmax of UTB SB-MOSFETs whereas the barrier height is of minor importance. However, both gate voltage and SB height affect the gm and gds obviously. For high performance of UTB SB-MOSFETs, appropriate gate voltage and SB height is of great importance.
Keywords
Acoustic scattering; Electromagnetic compatibility; MOSFETs; Monte Carlo methods; Optical scattering; Radio frequency; Schottky barriers; Silicides; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits, 2005 IEEE Conference on
Print_ISBN
0-7803-9339-2
Type
conf
DOI
10.1109/EDSSC.2005.1635268
Filename
1635268
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