• DocumentCode
    1988118
  • Title

    Experimental results and simulation of substrate noise coupling via planar spiral inductor in RF ICs

  • Author

    Pun, A. ; Yeung, T. ; Lau, J. ; Clement, F.J.R. ; Su, D.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Hong Kong Univ., Hong Kong
  • fYear
    1997
  • fDate
    10-10 Dec. 1997
  • Firstpage
    325
  • Lastpage
    328
  • Abstract
    While previous studies on substrate coupling focused mostly on noise induced through drain-bulk capacitance, substrate coupling from planar spiral inductors at radio frequency via the oxide capacitance have not been reported. This paper presents experimental data and simulation results for inductor-induced noise in the substrate. Noise coupling from conventional and hollow inductors via the substrate to P+ diffusions with and without guard rings were also examined. A compact model of the inductor and substrate that can accurately match the measured inductor-induced noise is then derived. Using the inductor-substrate model, we investigated the effectiveness of various guard rings configurations to reducing substrate noise coupling, the trade-off between noise coupling and self-inductance, and the coupling of noise from the inductor of a tuned RF amplifier.
  • Keywords
    integrated circuit noise; P+ diffusion; RF IC; guard ring; hollow inductor; oxide capacitance; planar spiral inductor; self-inductance; substrate noise coupling; tuned RF amplifier; Capacitance; Doping profiles; Inductors; Noise reduction; Radio frequency; Scattering parameters; Semiconductor device measurement; Semiconductor process modeling; Spirals; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-4100-7
  • Type

    conf

  • DOI
    10.1109/IEDM.1997.650393
  • Filename
    650393