DocumentCode
1988118
Title
Experimental results and simulation of substrate noise coupling via planar spiral inductor in RF ICs
Author
Pun, A. ; Yeung, T. ; Lau, J. ; Clement, F.J.R. ; Su, D.
Author_Institution
Dept. of Electr. & Electron. Eng., Hong Kong Univ., Hong Kong
fYear
1997
fDate
10-10 Dec. 1997
Firstpage
325
Lastpage
328
Abstract
While previous studies on substrate coupling focused mostly on noise induced through drain-bulk capacitance, substrate coupling from planar spiral inductors at radio frequency via the oxide capacitance have not been reported. This paper presents experimental data and simulation results for inductor-induced noise in the substrate. Noise coupling from conventional and hollow inductors via the substrate to P+ diffusions with and without guard rings were also examined. A compact model of the inductor and substrate that can accurately match the measured inductor-induced noise is then derived. Using the inductor-substrate model, we investigated the effectiveness of various guard rings configurations to reducing substrate noise coupling, the trade-off between noise coupling and self-inductance, and the coupling of noise from the inductor of a tuned RF amplifier.
Keywords
integrated circuit noise; P+ diffusion; RF IC; guard ring; hollow inductor; oxide capacitance; planar spiral inductor; self-inductance; substrate noise coupling; tuned RF amplifier; Capacitance; Doping profiles; Inductors; Noise reduction; Radio frequency; Scattering parameters; Semiconductor device measurement; Semiconductor process modeling; Spirals; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
Conference_Location
Washington, DC, USA
ISSN
0163-1918
Print_ISBN
0-7803-4100-7
Type
conf
DOI
10.1109/IEDM.1997.650393
Filename
650393
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