DocumentCode
1989769
Title
Effects of gate-insulator nitridation gas on MISiC Schottky-diode hydrogen sensors
Author
Tang, W.M. ; Leung, C.H. ; Lai, P.T. ; Xu, J.P.
Author_Institution
Department of Electrical and Electronic Engineering, the University of Hong Kong.
fYear
2005
fDate
19-21 Dec. 2005
Firstpage
717
Lastpage
720
Abstract
MISiC Schottky-diode hydrogen sensors with gate insulator grown in three different nitridation gases (NO, N2 O and NH3 ) are fabricated. Steady-state and transientresponse measurements are carried out at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that these nitrided sensors have high sensitivity and can give a rapid and stable response over a wide range of temperature. The study also finds that N2 O provides the fastest insulator growth with good insulator quality, and hence the highest sensitivity among the three nitrided samples. The N2 O-nitrided sensor can give significant response even at a low H2 concentration of 48-ppm H2 in N2 , indicating potential applications for detecting hydrogen leakage at high temperature. The response times of the three nitrided samples are also shorter than that of the control sample. At 300°C, the response time of the N2 O-nitrided sample to 48-ppm H2 in N2 is ll s, while that of the control sample is 65 s.
Keywords
Delay; Furnaces; Gas detectors; Gas insulation; Gases; Hydrogen; Metal-insulator structures; Silicon carbide; Stability; Temperature sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits, 2005 IEEE Conference on
Print_ISBN
0-7803-9339-2
Type
conf
DOI
10.1109/EDSSC.2005.1635376
Filename
1635376
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