DocumentCode
1999522
Title
Crystal-orientation controlled PZT FeRAM-capacitors using RF magnetron sputtering with 12"/spl phi/ single target
Author
Inoue, N. ; Maejima, Y. ; Hayashi, Y.
Author_Institution
ULSI Res. Lab., NEC Corp., Sagamihara, Japan
fYear
1997
fDate
10-10 Dec. 1997
Firstpage
605
Lastpage
608
Abstract
Crystal-orientation control of PZT is very important to obtain a ferroelectric capacitor with large remnant polarization. Perovskite PZT with {100}-orientation, parallel to the polarization axis, is obtained by RF-sputtering and 600/spl deg/C annealing. A metastable pyrochlore film, sputtered around 500/spl deg/C, is transformed to the crystal-orientated perovskite PZT film (stable phase). The PZT capacitor has large remnant polarization of 2P/sub r/=28 /spl mu/C/cm/sup 2/. The small capacitor, sized from 2 /spl mu/m/spl square/ to 100 /spl mu/m/spl square/, retains superior characteristics after Al metallization, being applicable to a high density FeRAM memory cell.
Keywords
dielectric polarisation; ferroelectric capacitors; ferroelectric storage; ferroelectric thin films; lead compounds; piezoceramics; random-access storage; sputter deposition; sputtered coatings; 12 in; 500 C; 600 C; Al; Al metallization; PZT; PbZrO3TiO3; RF magnetron sputtering; annealing; crystal-orientated perovskite PZT film; ferroelectric RAM; ferroelectric capacitors; high density memory cell; metastable pyrochlore film; remnant polarization; Annealing; Capacitors; Ferroelectric films; Ferroelectric materials; Metallization; Metastasis; Nonvolatile memory; Polarization; Radio frequency; Random access memory;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
Conference_Location
Washington, DC, USA
ISSN
0163-1918
Print_ISBN
0-7803-4100-7
Type
conf
DOI
10.1109/IEDM.1997.650457
Filename
650457
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