Models improvement and display optimization for three-dimensional etching simulation in lithography process

An overall lithography simulation has become an essential factor for semiconductor manufacturing, etching is a fatal process in the integrate circuit manufacture. Integrate circuit simulation is an important assistant method. This paper brings forward a math model of integrated circuits etching process and digitalizes the model, which is suited to 3D lithography environment and can be simulated through digital computers. At the same time, the surface evolving process of the etching process is considered and the related math model is proposed. Also the visualization technology and the related implementation of the etching process simulation are analyzed. At last, the result of the simulation is presented and discussed.