• DocumentCode
    2011048
  • Title

    Theta-like specimen to determine tensile strength at the micro scale

  • Author

    Gaither, Michael S. ; DelRio, Frank W. ; Gates, Richard S. ; Fuller, Edwin R. ; Cook, Robert F.

  • fYear
    2010
  • fDate
    24-28 Jan. 2010
  • Firstpage
    540
  • Lastpage
    543
  • Abstract
    Micro- and nano-electromechanical systems are typically formed via lithographic and etching processes that leave residual surface features, stresses, and chemistry that ultimately control component strength and thus device and system reliability. Here, we describe a new test specimen for micro-scale tensile strength measurements that allows for direct assessment of surface effects on strength. Specimens were formed from silicon-on-insulator wafers by deep reactive ion etching and tested with instrumented indentation. The experimental results were interpreted using finite element analyses to extract fracture strength. Fracture strengths as great as 3 GPa were observed, with fracture initiating at processing-induced flaws and propagating along {111} and {110} planes.
  • Keywords
    finite element analysis; fracture toughness testing; indentation; micromechanical devices; nanoelectromechanical devices; reliability; silicon-on-insulator; sputter etching; tensile strength; deep reactive ion etching; etching process; finite element analysis; fracture strength; instrumented indentation; lithographic process; microelectromechanical systems; microscale tensile strength measurements; nanoelectromechanical systems; reliability; silicon-on-insulator wafers; theta like specimen; Chemistry; Control systems; Etching; Nanoscale devices; Reliability; Residual stresses; Stress control; Surface cracks; Tensile stress; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
  • Conference_Location
    Wanchai, Hong Kong
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-5761-8
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2010.5442447
  • Filename
    5442447