DocumentCode
2011048
Title
Theta-like specimen to determine tensile strength at the micro scale
Author
Gaither, Michael S. ; DelRio, Frank W. ; Gates, Richard S. ; Fuller, Edwin R. ; Cook, Robert F.
fYear
2010
fDate
24-28 Jan. 2010
Firstpage
540
Lastpage
543
Abstract
Micro- and nano-electromechanical systems are typically formed via lithographic and etching processes that leave residual surface features, stresses, and chemistry that ultimately control component strength and thus device and system reliability. Here, we describe a new test specimen for micro-scale tensile strength measurements that allows for direct assessment of surface effects on strength. Specimens were formed from silicon-on-insulator wafers by deep reactive ion etching and tested with instrumented indentation. The experimental results were interpreted using finite element analyses to extract fracture strength. Fracture strengths as great as 3 GPa were observed, with fracture initiating at processing-induced flaws and propagating along {111} and {110} planes.
Keywords
finite element analysis; fracture toughness testing; indentation; micromechanical devices; nanoelectromechanical devices; reliability; silicon-on-insulator; sputter etching; tensile strength; deep reactive ion etching; etching process; finite element analysis; fracture strength; instrumented indentation; lithographic process; microelectromechanical systems; microscale tensile strength measurements; nanoelectromechanical systems; reliability; silicon-on-insulator wafers; theta like specimen; Chemistry; Control systems; Etching; Nanoscale devices; Reliability; Residual stresses; Stress control; Surface cracks; Tensile stress; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
Conference_Location
Wanchai, Hong Kong
ISSN
1084-6999
Print_ISBN
978-1-4244-5761-8
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2010.5442447
Filename
5442447
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