• DocumentCode
    2011543
  • Title

    Evaluation of piezoresistace coefficients of silico first-priciples band structures

  • Author

    Nakamura, Koichi ; Toriyama, Toshiyuki ; Sugiyama, Susumu

  • Author_Institution
    Ritsumeikan Univ., Kusatsu, Japan
  • fYear
    2010
  • fDate
    24-28 Jan. 2010
  • Firstpage
    436
  • Lastpage
    439
  • Abstract
    We have simulated piezoresistance coefficients in single-crystal hydrogen-terminated silicon nanosheets with (001) surface orientation on the basis of first-principles calculations of model structures. The [110] uniaxial tensile stress causes band deformation, and a drastic change of conductivity can be observed for nanosheet models. We have obtained high piezoresistance coefficients for p-type nanosheet of about 1 nm thickness, ¿l[110] = 174 × 10-11 Pa-1, and ¿t[110] = -139 × 10-11 Pa-1. It is expected that p-type ultra-thin Si(001) nanosheet will be a suitable candidates for nanoscale piezoresistors due to its giant piezoresistivity.
  • Keywords
    ab initio calculations; band structure; crystal orientation; deformation; elemental semiconductors; piezoresistance; silicon; tensile strength; Si; band deformation; band structures; first principles calculations; giant piezoresistivity; nanosheets; p-type ultra-thin nanosheet; piezoresistance coefficients; single-crystal hydrogen-terminated silicon; surface orientation; uniaxial tensile stress; Conducting materials; Conductivity; Nanowires; Photonic band gap; Piezoresistance; Piezoresistive devices; Silicon; Temperature; Tensile strain; Tensile stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
  • Conference_Location
    Wanchai, Hong Kong
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-5761-8
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2010.5442473
  • Filename
    5442473