DocumentCode
2012613
Title
Drain-conductance optimization in nanowire TFETs
Author
Gnani, E. ; Reggiani, S. ; Gnudi, A. ; Baccarani, G.
Author_Institution
ARCES & DEIS, Univ. of Bologna, Bologna, Italy
fYear
2012
fDate
17-21 Sept. 2012
Firstpage
105
Lastpage
108
Abstract
In this work we examine the problem of the nonlinear output characteristics of tunnel FETs, and the related small drain conductance at low drain voltage, which prevents rail-to-rail logic operation and severely degrades the device dynamic properties compared with standard CMOS FETs. The problem is investigated with the help of an analytical model which highlights the constraints of the device design by splitting the effects of the tunneling probability from the density of states in the source, channel and drain, and makes it possible to design a nanowire TFET by an appropriate selection of the material, nanowire size and degeneracy levels in the source and drain regions. So doing, we remove the above characteristics´ feature and recover a large drain conductance without degrading the subthreshold slope. The optimized device is numerically simulated using the k·p model, whose results are in fair agreement with the analytical one.
Keywords
field effect transistors; integrated circuit design; nanowires; numerical analysis; probability; tunnel transistors; analytical model; device design; device dynamic property; drain-conductance optimization; nanowire TFET design; nonlinear output characteristics; numerical simulation; rail-to-rail logic operation; tunnel FET; tunneling probability; Analytical models; CMOS integrated circuits; FETs; Logic gates; Optimization; Photonic band gap; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference (ESSDERC), 2012 Proceedings of the European
Conference_Location
Bordeaux
ISSN
1930-8876
Print_ISBN
978-1-4673-1707-8
Electronic_ISBN
1930-8876
Type
conf
DOI
10.1109/ESSDERC.2012.6343344
Filename
6343344
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