DocumentCode
2012916
Title
From FinFET to nanowire ISFET
Author
Zaborowski, Michal ; Tomaszewski, Daniel ; Dumania, Piotr ; Grabiec, Piotr
Author_Institution
Div. of Silicon Microsyst. & Nanostruct. Technol., Inst. of Electron Technol. ITE, Warsaw, Poland
fYear
2012
fDate
17-21 Sept. 2012
Firstpage
165
Lastpage
168
Abstract
A p-type FinFET manufacturing process has been presented. It is a starting point for development of H+ ion-sensitive n-type nanowire FETs (ISFETs). In the paper, new process steps are pointed out together with SEM examination. Characteristics of the n-type junctionless FETs have been measured in buffer solutions in a beaker and in contact with a single drop of the liquid. ISFET current versus pH and voltage versus pH curves have been presented and discussed. Relatively small hysteresis and drifts in pH measurements have been found.
Keywords
MOSFET; nanowires; SEM examination; ion sensitive n type nanowire FET; n type junctionless FET; nanowire ISFET; p type FinFET manufacturing process; Electrodes; FinFETs; Lithography; Logic gates; Sensor phenomena and characterization; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference (ESSDERC), 2012 Proceedings of the European
Conference_Location
Bordeaux
ISSN
1930-8876
Print_ISBN
978-1-4673-1707-8
Electronic_ISBN
1930-8876
Type
conf
DOI
10.1109/ESSDERC.2012.6343359
Filename
6343359
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