• DocumentCode
    2012916
  • Title

    From FinFET to nanowire ISFET

  • Author

    Zaborowski, Michal ; Tomaszewski, Daniel ; Dumania, Piotr ; Grabiec, Piotr

  • Author_Institution
    Div. of Silicon Microsyst. & Nanostruct. Technol., Inst. of Electron Technol. ITE, Warsaw, Poland
  • fYear
    2012
  • fDate
    17-21 Sept. 2012
  • Firstpage
    165
  • Lastpage
    168
  • Abstract
    A p-type FinFET manufacturing process has been presented. It is a starting point for development of H+ ion-sensitive n-type nanowire FETs (ISFETs). In the paper, new process steps are pointed out together with SEM examination. Characteristics of the n-type junctionless FETs have been measured in buffer solutions in a beaker and in contact with a single drop of the liquid. ISFET current versus pH and voltage versus pH curves have been presented and discussed. Relatively small hysteresis and drifts in pH measurements have been found.
  • Keywords
    MOSFET; nanowires; SEM examination; ion sensitive n type nanowire FET; n type junctionless FET; nanowire ISFET; p type FinFET manufacturing process; Electrodes; FinFETs; Lithography; Logic gates; Sensor phenomena and characterization; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference (ESSDERC), 2012 Proceedings of the European
  • Conference_Location
    Bordeaux
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4673-1707-8
  • Electronic_ISBN
    1930-8876
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2012.6343359
  • Filename
    6343359