Negative ion density distribution in a volume negative ion source-its dependence on plasma parameters

Author

Mori, Shinsuke ; Tauchi, Yuki ; Fukumasa, O. ; Hamabe, Makoto ; Takeiri, Y.

Author_Institution

Yamaguchi Univ., Ube, Japan

fYear

2003

fDate

5-5 June 2003

Firstpage

209

Abstract

Summary form only given, as follows. In a volume negative ion source, H/sup -/ ions are formed in hydrogen plasmas by dissociative attachment of slow plasma electrons to highly vibrationally excited hydrogen molecules, and these vibrational molecules are produced by energetic electron impact. Production of D/sup -/ ions is believed to be the same as that of H/sup -/ ions. To develop efficient D/sup -/ ion sources, it is important to study production and control of D/sub 2/ plasmas, and to understand difference in the negative ion volume production between H/sub 2/ plasmas and D/sub 2/ plasmas. For this purpose, we discuss isotope effect of H/sup -//D/sup -/ production and to clarify the dependence of negative ion production on plasma parameters by measuring negative ion densities in the source.

Keywords

dissociation; electron attachment; ion sources; negative ions; plasma density; D/sub 2/; H/sub 2/; dissociative attachment; highly vibrationally excited hydrogen molecules; negative ion density distribution; plasma parameters; slow plasma electrons; volume negative ion source; Ion sources; Magnetic field measurement; Magnetic separation; Particle beam measurements; Particle beams; Plasma density; Plasma measurements; Plasma simulation; Plasma sources; Production;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on

Conference_Location

Jeju, South Korea

ISSN

0730-9244

Print_ISBN

0-7803-7911-X

Type

conf

DOI

10.1109/PLASMA.2003.1228694

Filename

1228694