DocumentCode
2013222
Title
Development of ECR negative ion sources-effects of argon addition for ECR plasmas
Author
Fujioka, K. ; Fukumasa, O.
Author_Institution
Yamaguchi Univ., Japan
fYear
2003
fDate
5-5 June 2003
Firstpage
211
Abstract
Summary form only given, as follows. We have studied high-density plasma production and high efficiency H/sup $/production in ECR discharge plasmas with linecups-type and ring-cups-type magnetic fields, which are different ECR resonance conditions. In this paper, we report the effects of Ar addition on plasma parameters and negative ion production in ECR plasmas.
Keywords
argon; ion sources; Ar; Ar addition; ECR negative ion sources; ECR plasma; H; H/sup -/ production; negative ion production; plasma parameters; Argon; Cathodes; Ion sources; Magnetic separation; Plasma density; Plasma measurements; Plasma sources; Plasma temperature; Production; Tellurium;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1228698
Filename
1228698
Link To Document