• DocumentCode
    2014573
  • Title

    The emittance evolution of 3 MV injector

  • Author

    Zhiyong Dai ; Wendou Wang ; Kaizhi Zhang ; Sifu Chen

  • Author_Institution
    Inst. of Fluid Phys., China Acad. of Eng. Phys., Sichuan, China
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    242
  • Abstract
    Summary form only given, as follows. A new linear induction electron accelerator called DRAGON-I is now being studied and designed at CAEP. The high performance required for the accelerator is tightly connected to the high performance of injector A 3.2 MV/spl sim/3.5 MV injector, extracting at 90 nanosecond (60 ns flat), 2.5 kA/spl sim/3.5 kA electron beams has been studied and the parameters indicating the beam quality have been or are being measured. Among the parameters, the emittance is regarded as most important one. This paper relates the electron beam emittance evolution by PIC code. The relationships between emittance and velvet recess, emittance and beam current, emittance and external magnetic field, emittance and transport distance, etc., are discussed by simulation using PIC method. We wish to draw a conclusion form the emittance evolution and minimize the emittance of injector.
  • Keywords
    collective accelerators; electron accelerators; electron beams; high energy physics instrumentation computing; linear accelerators; particle beam injection; 2.5 to 3.5 kA; 3.2 to 3.5 MV; 60 ns; 90 ns; DRAGON-I; PIC code; electron beams; emittance evolution; injector; linear induction electron accelerator; transport distance; Argon; Delay effects; Electron accelerators; Electron beams; Induction generators; Laboratories; Materials processing; Physics; Pulse generation; Surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1228757
  • Filename
    1228757