DocumentCode
2014607
Title
Generation of enhanced pulsed electron beams by a pulse charge mode multi-gap pseudospark for material processing
Author
Kwon, Y.K. ; Nam, S.H. ; Park, S.S. ; Kim, S.H. ; Heo, H. ; Han, Y.J.
Author_Institution
Accelerator Lab., Pohang Inst. of Sci. & Technol., South Korea
fYear
2003
fDate
5-5 June 2003
Firstpage
242
Abstract
Summary form only given, as follows. An intense pulsed electron beam produced by a pseudospark discharge has been used for material processing. Such intense electron beams can be produced with high efficiency by a pulse charge mode pseudospark discharge. In this work, we experimentally investigated a pulse charge mode to generate enhanced pulsed electron beam from a 10-gap pseudospark device.
Keywords
electron beams; electron sources; plasma materials processing; sparks; 10-gap pseudospark device; enhanced pulsed electron beams generation; material processing; pulse charge mode multi-gap pseudospark; Argon; Delay effects; Electron accelerators; Electron beams; Induction generators; Laboratories; Magnetic fields; Materials processing; Pulse generation; Surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1228758
Filename
1228758
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