DocumentCode
2019559
Title
Comparison of electron density measurements by using a plasma absorption probe and a double Langmuir probe in inductively coupled plasmas
Author
Jung-Hyung Kim ; Sang-Chul Choi ; Yong-Hyun Shin ; Kwang-Hwa Chung
Author_Institution
Center for Vacuum Technol., Korea Res. Inst. of Stand. & Sci., Daejeon, South Korea
fYear
2003
fDate
5-5 June 2003
Firstpage
346
Abstract
Summary form only given, as follows. The absolute, spatially resolved electron densities in inductively coupled plasmas have been measured by using two different plasma diagnostic tools, a plasma absorption probe and double Langmuir probe. The plasma absorption probe is able to measure the absolute, spatially resolved electron density even when the probe is soiled with processing plasmas. The technique is based on the resonant absorption of surface waves excited in a cavity at the probe head. The plasma absorption probe consists of a small antenna connected with a coaxial cable. The antenna is enclosed in a tube inserted in a plasma. The plasma source is a planar inductively coupled plasma. Over a wide parameter range (gas type, input power and gas pressure), the results by the two techniques are compared and analyzed.
Keywords
Langmuir probes; plasma density; plasma probes; plasma sources; coaxial cable; double Langmuir probe; inductively coupled plasmas; plasma absorption probe; plasma diagnostic tools; resonant absorption; small antenna; spatially resolved electron densities; surface waves; Absorption; Density measurement; Electrons; Plasma density; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma sources; Plasma waves; Probes;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1228951
Filename
1228951
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