DocumentCode
2021904
Title
Plasma implantation of inner wall of cylindrical insulating tube
Author
Tian, X.B. ; Yan, J.C. ; Yang, S.Q. ; Fu, R.K.Y. ; Chu, Paul K.
Author_Institution
Harbin Inst. of Technol., China
fYear
2003
fDate
5-5 June 2003
Firstpage
398
Abstract
Summary form only given, as follows. In this work, we conduct numerical investigation on the plasma implantation of the inner walls of insulating cylindrical tubes. Our I work focuses on the effects of the thickness of the insulating wall, inner diameter, distance between the negatively biased auxiliary electrode and the tube, and other factors.
Keywords
numerical analysis; plasma immersion ion implantation; cylindrical insulating tube; inner wall; negatively biased auxiliary electrode; numerical investigation; plasma implantation; Atomic force microscopy; Conducting materials; Inorganic materials; Insulation; Materials science and technology; Plasma immersion ion implantation; Plasma properties; Plasma sources; Semiconductor materials; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1229049
Filename
1229049
Link To Document