• DocumentCode
    2031509
  • Title

    Low-temperature conduction mechanisms of 3-nm-thick post-soft breakdown SiO2 films

  • Author

    Komiya, K. ; Omura, Y. ; Oka, T. ; Nagahara, M.

  • Author_Institution
    Kansai University
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    103
  • Lastpage
    106
  • Keywords
    Conductive films; Current density; Electric breakdown; Fluctuations; Leakage current; MOS capacitors; Permittivity; Scattering; Temperature dependence; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Low Temperature Electronics, 2002. Proceedings of the 5th European Workshop on
  • ISSN
    1155-4339
  • Print_ISBN
    2-86883-606-2
  • Type

    conf

  • DOI
    10.1109/WOLTE.2002.1022459
  • Filename
    1022459
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2031509