• DocumentCode
    2032027
  • Title

    Experimental Evaluation of Second Harmonic Generation for Non-Invasive Contamination Detection in SOI Wafers

  • Author

    Alles, Michael L. ; Schrimpf, Ronald D. ; Fleetwood, Daniel M. ; Pasternak, Robert ; Tolk, Norman H. ; Standley, Robert W.

  • Author_Institution
    Vanderbilt Univ., Nashville, TN
  • fYear
    2006
  • fDate
    22-24 May 2006
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    We report experimental results from non-invasive second harmonic generation (SHG) measurements applied to detect the presence of contamination at the silicon/buried oxide (BOX) and BOX/substrate interfaces in silicon-on-insulator (SOI) wafers. The potential application of SHG as a metrology tool for process control is demonstrated
  • Keywords
    contamination; harmonic generation; process control; silicon-on-insulator; SOI wafers; Si; buried oxide; noninvasive contamination detection; process control; second harmonic generation; silicon on insulator; Contamination; Frequency conversion; Metrology; Optical harmonic generation; Plasma measurements; Pollution measurement; Pulse measurements; Semiconductor materials; Silicon on insulator technology; Ultrafast optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    1-4244-0254-9
  • Type

    conf

  • DOI
    10.1109/ASMC.2006.1638714
  • Filename
    1638714