Sputtering type neutral loop discharge plasma

Summary form only given, as follows. A magnetic neutral loop discharge (NLD) plasma has attracted much attention as a new plasma source that satisfies these requirements. In this study, a new type of plasma system based on the magnetic neutral loop discharge concept has been developed for sputter application. This system is characterized by plasma production around the multi-null magnetic field on the electrode surface. When the high frequency electric field is applied to the null region via the target by a 13.56 MHz RF generator, the electrons move in a similar manner (meandering motion) in the electric and magnetic fields as in the inductive type NLD plasma. Also, the angular location of the null region on the surface of target can be varied by rotating the inner or outer magnets. It is thus expected that the dynamic control of the plasma over the target surface will be realized, because rotating and arranging the outer permanent magnets can actively control the position and area of the magnetic null field region.