Effect of insulator sleeve length on soft X-ray emissions from dense plasma focus device

Summary form only given, as follows. The plasma focus device has recently emerged as one of the most prominent soft X-ray point sources and is being recognized as a suitable source for X-ray lithography, microscopy and micromachining. Lithography appears promising with recent investigations of plasma focus sources, designed specifically for soft X-ray proximity. A high repetition rate, high performance compact plasma focus device has been successfully used in the past in our lab for demonstration lithography of line width down to below 0.2 /spl mu/m using neon soft X-rays.