• DocumentCode
    2040034
  • Title

    Experimental characterization of dummies impact on interconnects propagation performance. Optimization of dummy sizes for the CMOS 22 nm technology node

  • Author

    Blampey, B. ; Gallitre, M. ; Farcy, A. ; Poncharra, J. ; Bermond, C. ; Flechet, B.

  • Author_Institution
    UMR CNRS 5130, Univ. de Savoie, Le Bourget du Lac
  • fYear
    2008
  • fDate
    12-15 May 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Based on experimental characterization, the impact of dummies on interconnects propagation performance is investigated. The study is focused on the impact of sizes and placements of these dummies. First a method to quantify impact of dummies on delay is detailed. Next we show that dummy sizes can be optimized to minimize their impacts on interconnects performance of the 22 nm node.
  • Keywords
    CMOS integrated circuits; integrated circuit interconnections; CMOS technology node; dummies impact; interconnects propagation; Attenuation; CMOS technology; Copper; Delay; Dielectric constant; Dielectric materials; Etching; Inductance; Magnetic fields; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Signal Propagation on Interconnects, 2008. SPI 2008. 12th IEEE Workshop on
  • Conference_Location
    Avignon
  • Print_ISBN
    978-1-4244-2317-0
  • Electronic_ISBN
    978-1-4244-2318-7
  • Type

    conf

  • DOI
    10.1109/SPI.2008.4558373
  • Filename
    4558373
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2040034