• DocumentCode
    2044375
  • Title

    Pulsed Laser Deposited Ag-Sio2 Nanocomposite Thin Films For Vacuum Microelectronic Applications

  • Author

    Tsang, W.M. ; Henley, S.J. ; Blanchard, N. ; Silva, S.R.P.

  • Author_Institution
    Nano-Electron. Centre, Surrey Univ., Guildford
  • fYear
    2006
  • fDate
    38899
  • Firstpage
    377
  • Lastpage
    378
  • Abstract
    Ag-SiO2 nanocomposite layers are synthesized by pulsed laser ablation at room temperature. The synthesized materials are characterized using XPS, RBS, SEM and TEM and the field emission properties are investigated
  • Keywords
    Rutherford backscattering; X-ray photoelectron spectra; field emission; nanocomposites; pulsed laser deposition; scanning electron microscopy; silicon compounds; silver; transmission electron microscopy; vacuum deposited coatings; vacuum microelectronics; 20 to 120 nm; 293 to 298 K; Ag-SiO2; RBS; SEM; TEM; XPS; field emission; nanocomposite thin films; room temperature pulsed laser ablation; vacuum microelectronics; Atomic beams; Atomic layer deposition; Atomic measurements; Iron; Laser ablation; Microelectronics; Optical pulses; Pulse measurements; Pulsed laser deposition; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
  • Conference_Location
    Guilin
  • Print_ISBN
    1-4244-0401-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2006.335226
  • Filename
    4134617
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2044375