DocumentCode
2048616
Title
Polyimide copper thin film redistribution on glass ceramic/copper multilevel substrates
Author
Redmond, T.F. ; Prasad, C. ; Walker, G.A.
Author_Institution
IBM Corp., Hopewell Junction, NY, USA
fYear
1991
fDate
11-16 May 1991
Firstpage
689
Lastpage
692
Abstract
The first-level package developed for Models 820 and 900 of the IBM ES9000 system family combines polymide copper thin-film technology with glass-ceramic technology to provide high wiring density and excellent electrical performance. The realization of the design application of the technology of the IBM ES9000 resulted in the development of several thin-film technologies for packaging. Some of these are: a photolith expose strategy to match the irregular image of a sintered ceramic substrate to a regular photolithographic grid; a reliable, planar layer interconnection structure based on an application of projection laser ablation technology; a novel redundant wiring structure which provides both high yield wiring and terminal metal structures; and a comprehensive, reliable repair strategy
Keywords
IBM computers; mainframes; packaging; wiring; IBM ES9000 system family; IBM computers; Model 820; Model 900; electrical performance; first-level package; glass-ceramic technology; mainframes; photolith expose strategy; planar layer interconnection structure; polymide copper thin-film technology; projection laser ablation technology; redundant wiring structure; repair strategy; wiring density; Ceramics; Copper; Glass; Laser ablation; Laser applications; Packaging; Polyimides; Substrates; Transistors; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 1991. Proceedings., 41st
Conference_Location
Atlanta, GA
Print_ISBN
0-7803-0012-2
Type
conf
DOI
10.1109/ECTC.1991.163955
Filename
163955
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