• DocumentCode
    2048616
  • Title

    Polyimide copper thin film redistribution on glass ceramic/copper multilevel substrates

  • Author

    Redmond, T.F. ; Prasad, C. ; Walker, G.A.

  • Author_Institution
    IBM Corp., Hopewell Junction, NY, USA
  • fYear
    1991
  • fDate
    11-16 May 1991
  • Firstpage
    689
  • Lastpage
    692
  • Abstract
    The first-level package developed for Models 820 and 900 of the IBM ES9000 system family combines polymide copper thin-film technology with glass-ceramic technology to provide high wiring density and excellent electrical performance. The realization of the design application of the technology of the IBM ES9000 resulted in the development of several thin-film technologies for packaging. Some of these are: a photolith expose strategy to match the irregular image of a sintered ceramic substrate to a regular photolithographic grid; a reliable, planar layer interconnection structure based on an application of projection laser ablation technology; a novel redundant wiring structure which provides both high yield wiring and terminal metal structures; and a comprehensive, reliable repair strategy
  • Keywords
    IBM computers; mainframes; packaging; wiring; IBM ES9000 system family; IBM computers; Model 820; Model 900; electrical performance; first-level package; glass-ceramic technology; mainframes; photolith expose strategy; planar layer interconnection structure; polymide copper thin-film technology; projection laser ablation technology; redundant wiring structure; repair strategy; wiring density; Ceramics; Copper; Glass; Laser ablation; Laser applications; Packaging; Polyimides; Substrates; Transistors; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 1991. Proceedings., 41st
  • Conference_Location
    Atlanta, GA
  • Print_ISBN
    0-7803-0012-2
  • Type

    conf

  • DOI
    10.1109/ECTC.1991.163955
  • Filename
    163955