DocumentCode
2049382
Title
OPERA: optimization with ellipsoidal uncertainty for robust analog IC design
Author
Yang Xu ; Xin Li ; Kan-Lin Hsiung ; Boyd, Stephen ; Nausieda, I.
Author_Institution
Dept. of Elec. & Comp. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear
2005
fDate
13-17 June 2005
Firstpage
632
Lastpage
637
Abstract
As the design-manufacturing interface becomes increasingly complicated with IC technology scaling, the corresponding process variability poses great challenges for nanoscale analog/RF design. Design optimization based on the enumeration of process corners has been widely used, but can suffer from inefficiency and overdesign. In this paper we propose to formulate the analog and RF design with variability problem as a special type of robust optimization problem, namely robust geometric programming. The statistical variations in both the process parameters and design variables are captured by a pre-specified confidence ellipsoid. Using such optimization with ellipsoidal uncertainty approach, robust design can be obtained with guaranteed yield bound and lower design cost, and most importantly, the problem size grows linearly with number of uncertain parameters. Numerical examples demonstrate the efficiency and reveal the trade-off between the design cost versus the yield requirement. We will also demonstrate significant improvement in the design cost using this approach compared with corner-enumeration optimization.
Keywords
analogue integrated circuits; circuit optimisation; design aids; geometric programming; integrated circuit design; radiofrequency integrated circuits; statistical analysis; IC technology scaling; OPERA; corner-enumeration optimization; design optimization; design-manufacturing interface; ellipsoidal uncertainty; nanoscale RF design; nanoscale analog design; robust analog IC design; robust geometric programming; robust optimization problem; statistical optimization; uncertain parameters; Algorithm design and analysis; Analog integrated circuits; Costs; Design optimization; Manufacturing processes; Permission; Radio frequency; Robustness; Semiconductor device manufacture; Uncertainty;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2005. Proceedings. 42nd
Print_ISBN
1-59593-058-2
Type
conf
DOI
10.1109/DAC.2005.193888
Filename
1510408
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