• DocumentCode
    2052398
  • Title

    Modifying the nanostructure of Co[SiO2] samples by controlled annealing

  • Author

    Denardin, J.C. ; Knobel, M. ; Socolovsky, L.M. ; Brandl, A.L. ; Zhang, X.X.

  • Author_Institution
    Inst. de Fisica Gleb Wataghin, Univ. Estadual de Campinas, Sao Paulo, Brazil
  • fYear
    2003
  • fDate
    March 30 2003-April 3 2003
  • Lastpage
    10
  • Abstract
    In this article, on-line measurements of resistance were made on co-sputtered Co[SiO/sub 2/] /sub 0.65/ granular films during annealing. The aim was to control the thermal treatment parameters and map the microstructural changes in the sample, and the respective magnetotransport response.
  • Keywords
    annealing; cobalt; crystal microstructure; ferromagnetic materials; magnetic thin films; magnetoresistance; nanocomposites; silicon compounds; sputtered coatings; Co-SiO/sub 2/; Co[SiO/sub 2/] nanostructure; annealing; co-sputtered Co[SiO/sub 2/] /sub 0.65/ granular films; magnetotransport response; microstructure; thermal treatment; Annealing; Conductivity; Cooling; Curve fitting; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2003. INTERMAG 2003. IEEE International
  • Conference_Location
    Boston, MA, USA
  • Print_ISBN
    0-7803-7647-1
  • Type

    conf

  • DOI
    10.1109/INTMAG.2003.1230705
  • Filename
    1230705
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2052398