DocumentCode
2052666
Title
Supply signal fluctuations due to chip power grid resonance — a new reliability concern
Author
Gurfinkel, M. ; Livshits, P. ; Rozen, A. ; Fefer, Y. ; Bernstein, J.B. ; Shapira, Yoram
Author_Institution
Sch. of EE, Tel Aviv Univ., Tel Aviv
fYear
2008
fDate
April 27 2008-May 1 2008
Firstpage
721
Lastpage
722
Abstract
On-die measurements of VDD and VSS signals inside a 90 nm technology chip are presented. The results show fluctuations in the VDD and VSS signals, which might constitute an important new reliability concern. These fluctuations also indirectly affect other reliability mechanisms, such as NBTI, HCI and TDDB. Simulations predict aggravation of this phenomenon for future technologies, which may prove to be a show stopper for further scaling.
Keywords
fluctuations; integrated circuit reliability; nanotechnology; power grids; HCI; NBTI; TDDB; chip power grid resonance; integrated circuit reliability; nanotechnology chip; size 90 nm; supply signal fluctuations; CMOS technology; Fluctuations; Human computer interaction; Logic testing; Niobium compounds; Power grids; Resonance; Semiconductor device measurement; Titanium compounds; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
Conference_Location
Phoenix, AZ
Print_ISBN
978-1-4244-2049-0
Electronic_ISBN
978-1-4244-2050-6
Type
conf
DOI
10.1109/RELPHY.2008.4559006
Filename
4559006
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