• DocumentCode
    2054308
  • Title

    Plasma CVD treatment for titanium dioxides to approach the high performance of photocatalysts by visible light irradiation

  • Author

    Yamamoto, Kazuya ; Matsuura, Yuki ; Nakamura, Ayako ; Sonoda, Tatsuhiko ; Matsushima, Shigenori ; Yamada, Kenji

  • Author_Institution
    Dept. of Mater. Sci. & Chem. Eng., Kitakyushu Nat. Coll. of Technol., Fuoka, Japan
  • fYear
    2010
  • fDate
    21-24 Nov. 2010
  • Firstpage
    2228
  • Lastpage
    2232
  • Abstract
    TiO2 particles or casted thin films are treated with plasma CVD using the mixture of tantalum alkoxide and nitrogen gas or copper(II) acetylacetonate to improve the photocatalyst activities of TiO2 irradiated by visible light. The layer formed on the surface of the TiO2 after plasma treatment is composed of some species characterized by XPS measurement. The visible-light activity are shown after the plasma CVD treatment to the surface of TiO2.
  • Keywords
    X-ray photoelectron spectra; catalysts; photochemistry; plasma CVD; radiation effects; thin films; titanium compounds; TiO2; XPS; casted thin films; copper(II) acetylacetonate; nitrogen gas; photocatalysts; plasma CVD treatment; tantalum alkoxide; titanium dioxides; visible light irradiation; photocatalyst; plasma CVD treatment; titanium dioxide; visible light;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TENCON 2010 - 2010 IEEE Region 10 Conference
  • Conference_Location
    Fukuoka
  • ISSN
    pending
  • Print_ISBN
    978-1-4244-6889-8
  • Type

    conf

  • DOI
    10.1109/TENCON.2010.5686668
  • Filename
    5686668
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2054308