• DocumentCode
    2055180
  • Title

    Integrated silicon waveguide for intra-chip communication: A practical experience

  • Author

    Ekekwe, Ndubuisi

  • Author_Institution
    Electr.&Comput. Eng., Johns Hopkins Univ., Baltimore, MD
  • fYear
    2007
  • fDate
    8-10 July 2007
  • Firstpage
    15
  • Lastpage
    18
  • Abstract
    This paper presents the design and fabrication of a waveguide in silicon using traditional microfabrication and manufacturing processes. Integrated waveguide has become important owing to the need for faster computing and the problems associated with copper as technology scales into the nanometer regime. Furthermore, photonic on-chip interconnect offers better latency, higher bandwidth capacity, power efficiency, faster speed and reduced interference when compared with electrical interconnect. To test the silicon waveguide, a Gb/s communication system was assembled and laser light was coupled and transmitted through the chip.
  • Keywords
    etching; ion implantation; lithography; optical waveguides; silicon; Si; electrical interconnect; etching; integrated silicon waveguide; intra-chip communication; ion implantation; laser light; lithography; microfabrication; photonic on-chip interconnect; power efficiency; Bandwidth; Copper; Delay; Interference; Manufacturing processes; Optical device fabrication; Power system interconnection; Silicon; System testing; Waveguide components;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Microsystems, 2007 International Students and Young Scientists Workshop on
  • Conference_Location
    Dresden
  • Print_ISBN
    978-1-4244-1313-3
  • Electronic_ISBN
    978-1-4244-1314-0
  • Type

    conf

  • DOI
    10.1109/STYSW.2007.4559115
  • Filename
    4559115