DocumentCode
2055180
Title
Integrated silicon waveguide for intra-chip communication: A practical experience
Author
Ekekwe, Ndubuisi
Author_Institution
Electr.&Comput. Eng., Johns Hopkins Univ., Baltimore, MD
fYear
2007
fDate
8-10 July 2007
Firstpage
15
Lastpage
18
Abstract
This paper presents the design and fabrication of a waveguide in silicon using traditional microfabrication and manufacturing processes. Integrated waveguide has become important owing to the need for faster computing and the problems associated with copper as technology scales into the nanometer regime. Furthermore, photonic on-chip interconnect offers better latency, higher bandwidth capacity, power efficiency, faster speed and reduced interference when compared with electrical interconnect. To test the silicon waveguide, a Gb/s communication system was assembled and laser light was coupled and transmitted through the chip.
Keywords
etching; ion implantation; lithography; optical waveguides; silicon; Si; electrical interconnect; etching; integrated silicon waveguide; intra-chip communication; ion implantation; laser light; lithography; microfabrication; photonic on-chip interconnect; power efficiency; Bandwidth; Copper; Delay; Interference; Manufacturing processes; Optical device fabrication; Power system interconnection; Silicon; System testing; Waveguide components;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics and Microsystems, 2007 International Students and Young Scientists Workshop on
Conference_Location
Dresden
Print_ISBN
978-1-4244-1313-3
Electronic_ISBN
978-1-4244-1314-0
Type
conf
DOI
10.1109/STYSW.2007.4559115
Filename
4559115
Link To Document