A reliability study of laser trimmed NiCr kerfs

Author

Linn, J.H. ; LaFontaine, D.B. ; Belcher, R.W. ; Shlepr, M.G. ; Wade, W.R.

Author_Institution

Harris Corp., Melbourne, FL, USA

fYear

1991

fDate

11-16 May 1991

Firstpage

883

Lastpage

889

Abstract

Visually acceptable, laser-trimmed nickel-chromium (nichrome) resistors were investigated for electrical stability after microanalysis data showed residual material in the lazed area. Electrical testing indicates that the amount of residual material in the kerf does not related to resistor instability when the applied voltage is less than 5 V. Analytical data show that the laser energy used to trim the nichrome resistor is sufficient to physically and chemically disrupt the nichrome structure. The disruption of the nichrome results in a stable chemical equilibrium within the kerf. Residual material in the kerf, resulting from decreased laser power or focus, is not a condition that causes device instability

Keywords

chromium alloys; laser beam machining; nickel alloys; reliability; stability; thin film resistors; 5 V; device instability; electrical stability; laser energy; laser trimmed NiCr kerfs; nichrome; reliability; residual material; resistors; stable chemical equilibrium; Chemical analysis; Chemical lasers; Data analysis; Laser stability; Laser theory; Materials testing; Optical materials; Power lasers; Resistors; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronic Components and Technology Conference, 1991. Proceedings., 41st

Conference_Location

Atlanta, GA

Print_ISBN

0-7803-0012-2

Type

conf

DOI

10.1109/ECTC.1991.163983

Filename

163983