DocumentCode
2057796
Title
Patterning of nanomembranes with a focused-ion-beam
Author
Matovic, J. ; Kettle, J. ; Brousseau, E. ; Adamovic, N.
Author_Institution
Fac. of Electr. Eng. & Inf. Technol., Inst. of Sensors & Actuators, Vienna
fYear
2008
fDate
11-14 May 2008
Firstpage
103
Lastpage
106
Abstract
A nanomembrane is a new MEMS/NEMS structural component. Most nanomembrane structures consist of a free-standing element, with a mean thickness between 5 and 30 nm. In contrast to its thickness, the lateral dimensions of a nanomembrane are in the range of 3 to 5 mm. In this paper, the fabrication of a new type of nanomembranes with a thickness of approximately 20 atomic layers and with a large area is presented. In addition, this study demonstrates that focused-ion beam (FIB) can be applied successfully to the patterning of such nanomembranes.
Keywords
focused ion beam technology; membranes; micromechanical devices; nanopatterning; nanostructured materials; MEMS/NEMS structural component; focused ion beam; nanomembranes; patterning; size 3 mm to 5 mm; Atomic layer deposition; Biomedical optical imaging; Fabrication; Nanobioscience; Nanoscale devices; Nanostructures; Optical filters; Optical sensors; Resists; Silicon carbide;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 2008. MIEL 2008. 26th International Conference on
Conference_Location
Nis
Print_ISBN
978-1-4244-1881-7
Electronic_ISBN
978-1-4244-1882-4
Type
conf
DOI
10.1109/ICMEL.2008.4559233
Filename
4559233
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