DocumentCode
2060269
Title
Nanorheology of squeezed polymer films
Author
Connell, Barry O. ; Cross, Graham L W ; Pethica, John B. ; Oliver, Warren
Author_Institution
SFI Nanosci. Lab., Trinity Coll., Dublin, Ireland
Volume
2
fYear
2003
fDate
12-14 Aug. 2003
Firstpage
793
Abstract
We present investigations of submicrometer quasi-two dimensional flow mechanics of squeezed thin polymer films in the context of nanoimprint lithography. The polymer films were indented by patterned spherical indenters above and below the glass transition region in a temperature controlled nanoindenter. Static and dynamical mechanical characteristics of the contact were monitored during the printing process. We demonstrate the relation of substrate deformation in the cold embossing technique and residual stress relaxation during hot embossing to the overall pattern transfer fidelity during isothermal stamping.
Keywords
elastic deformation; embossing; glass transition; indentation; internal stresses; nanolithography; polymer films; rheology; stress relaxation; cold embossing method; dynamical mechanical characteristics; glass transition; hot embossing; isothermal stamping; nanoimprint lithography; nanoindenter; nanorheology; pattern transfer fidelity; patterned spherical indenters; residual stress relaxation; squeezed thin polymer films; statical mechanical characteristics; submicrometer quasi two dimensional flow mechanics; substrate deformation; Embossing; Milling; Polymer films; Printing; Residual stresses; Shape; Silicon; Substrates; Temperature; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN
0-7803-7976-4
Type
conf
DOI
10.1109/NANO.2003.1231033
Filename
1231033
Link To Document