• DocumentCode
    2060269
  • Title

    Nanorheology of squeezed polymer films

  • Author

    Connell, Barry O. ; Cross, Graham L W ; Pethica, John B. ; Oliver, Warren

  • Author_Institution
    SFI Nanosci. Lab., Trinity Coll., Dublin, Ireland
  • Volume
    2
  • fYear
    2003
  • fDate
    12-14 Aug. 2003
  • Firstpage
    793
  • Abstract
    We present investigations of submicrometer quasi-two dimensional flow mechanics of squeezed thin polymer films in the context of nanoimprint lithography. The polymer films were indented by patterned spherical indenters above and below the glass transition region in a temperature controlled nanoindenter. Static and dynamical mechanical characteristics of the contact were monitored during the printing process. We demonstrate the relation of substrate deformation in the cold embossing technique and residual stress relaxation during hot embossing to the overall pattern transfer fidelity during isothermal stamping.
  • Keywords
    elastic deformation; embossing; glass transition; indentation; internal stresses; nanolithography; polymer films; rheology; stress relaxation; cold embossing method; dynamical mechanical characteristics; glass transition; hot embossing; isothermal stamping; nanoimprint lithography; nanoindenter; nanorheology; pattern transfer fidelity; patterned spherical indenters; residual stress relaxation; squeezed thin polymer films; statical mechanical characteristics; submicrometer quasi two dimensional flow mechanics; substrate deformation; Embossing; Milling; Polymer films; Printing; Residual stresses; Shape; Silicon; Substrates; Temperature; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
  • Print_ISBN
    0-7803-7976-4
  • Type

    conf

  • DOI
    10.1109/NANO.2003.1231033
  • Filename
    1231033