Studies on the oxidation of iron films on differently oriented Si substrates

Fe films have been grown on different oriented Si substrates by MOCVD, and then samples were put in the air without any protection for nearly fifteen years. We have used methods such as XRD and XPS to identify the composition and structure of the epitaxial films on different oriented substrates. It is obvious that different orientation of the substrates results in different epitaxial film with different characteristics. Using methods such as VSM and FMR, we also investigate the magnetic properties of the epitaxial layers on different oriented substrates. The magnetic properties depend on the composition and structure of the epitaxial layers. Different substrate orientation results in different easy magnetization direction, anisotropy and coercive force. The FMR analysis results match the VSM ones quite well.