Two novel schemes for truncating finite element meshes

Author

Jian Gong ; Volakis, J.L.

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA

Volume

1

fYear

1995

fDate

18-23 June 1995

Firstpage

80

Abstract

In this paper, we investigate two mesh truncation schemes for finite element method (FEM) simulations. Specifically, we examine the performance of a new anisotropic perfectly matching layer and a numerical boundary condition (NBC) for truncating standard and printed guided structures. Results will be presented for modeling propagation in metallic waveguides and shielded microstrip lines.

Keywords

electromagnetic wave propagation; electromagnetic wave reflection; mesh generation; microstrip lines; rectangular waveguides; waveguide theory; FEM simulations; anisotropic perfectly matching layer; finite element meshes; mesh truncation schemes; metallic waveguides; numerical boundary condition; performance; printed guided structures; propagation; rectangular waveguides; relection coefficient; shielded microstrip line; Anisotropic magnetoresistance; Computational modeling; Computer simulation; Finite element methods; Laboratories; OFDM modulation; Probes; Rectangular waveguides; Reflection; Tensile stress;

fLanguage

English

Publisher

ieee

Conference_Titel

Antennas and Propagation Society International Symposium, 1995. AP-S. Digest

Conference_Location

Newport Beach, CA, USA

Print_ISBN

0-7803-2719-5

Type

conf

DOI

10.1109/APS.1995.529968

Filename

529968