• DocumentCode
    2064195
  • Title

    Session 17 overview: Embedded memory and DRAM I/O: Memory subcommittee

  • Author

    Chang, Leland ; Yoshikawa, Takefumi

  • Author_Institution
    IBM, Yorktown Heights, NY
  • fYear
    2015
  • fDate
    22-26 Feb. 2015
  • Firstpage
    308
  • Lastpage
    309
  • Abstract
    Demand for smaller and lighter personal devices with increasing functionality in the cloud drives advancements in both embedded memory technology and high-speed DRAM interfaces. Lower power through voltage reduction and increased performance through higher memory density and bandwidth are key enablers. This year´s conference highlights 14nm FinFET technologies with the smallest bit cells achieved to date for both SRAM — at 0.05μm2 — and embedded DRAM — at 0.01747μm2. A new assist technique to drive VMIN reduction and novel bit cells for both 2-port SRAM and TCAM applications are also presented. In addition, two area-efficient techniques to boost DRAM bandwidth are reported.
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid- State Circuits Conference - (ISSCC), 2015 IEEE International
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    978-1-4799-6223-5
  • Type

    conf

  • DOI
    10.1109/ISSCC.2015.7063049
  • Filename
    7063049