DocumentCode
2070756
Title
The impacts of dimensions and return current path geometry on coupling in single ended Through Silicon Vias
Author
Curran, Brian ; Ndip, Ivan ; Guttovski, Stephan ; Reichl, Herbert
Author_Institution
Fraunhofer Inst. for Reliability & Microintegration, Berlin
fYear
2009
fDate
26-29 May 2009
Firstpage
1092
Lastpage
1097
Abstract
Through Silicon Vias (TSVs) are expected to play an increasingly important role in next-generation microelectronics packaging. Even when the challenge of attenuation is overcome, crosstalk remains a major concern in TSV design. In this paper, it is shown that, at frequencies above 20 GHz, near-end crosstalk can easily exceed -20 dB. Traditional analytical models for crosstalk are compared to full-wave simulations to determine their limitations and a lumped element equivalent circuit model is presented. An examination of the impact of TSV dimensions is presented. Then, three TSV structures are compared and the impact of their dimensions on crosstalk is investigated.
Keywords
electronics packaging; elemental semiconductors; equivalent circuits; integrated circuit modelling; integrated circuit packaging; silicon; Si; lumped element equivalent circuit model; near-end crosstalk; next-generation microelectronics packaging; single ended through silicon vias; Analytical models; Attenuation; Circuit simulation; Crosstalk; Frequency; Geometry; Microelectronics; Packaging; Silicon; Through-silicon vias;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2009. ECTC 2009. 59th
Conference_Location
San Diego, CA
ISSN
0569-5503
Print_ISBN
978-1-4244-4475-5
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2009.5074148
Filename
5074148
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