• DocumentCode
    2070756
  • Title

    The impacts of dimensions and return current path geometry on coupling in single ended Through Silicon Vias

  • Author

    Curran, Brian ; Ndip, Ivan ; Guttovski, Stephan ; Reichl, Herbert

  • Author_Institution
    Fraunhofer Inst. for Reliability & Microintegration, Berlin
  • fYear
    2009
  • fDate
    26-29 May 2009
  • Firstpage
    1092
  • Lastpage
    1097
  • Abstract
    Through Silicon Vias (TSVs) are expected to play an increasingly important role in next-generation microelectronics packaging. Even when the challenge of attenuation is overcome, crosstalk remains a major concern in TSV design. In this paper, it is shown that, at frequencies above 20 GHz, near-end crosstalk can easily exceed -20 dB. Traditional analytical models for crosstalk are compared to full-wave simulations to determine their limitations and a lumped element equivalent circuit model is presented. An examination of the impact of TSV dimensions is presented. Then, three TSV structures are compared and the impact of their dimensions on crosstalk is investigated.
  • Keywords
    electronics packaging; elemental semiconductors; equivalent circuits; integrated circuit modelling; integrated circuit packaging; silicon; Si; lumped element equivalent circuit model; near-end crosstalk; next-generation microelectronics packaging; single ended through silicon vias; Analytical models; Attenuation; Circuit simulation; Crosstalk; Frequency; Geometry; Microelectronics; Packaging; Silicon; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2009. ECTC 2009. 59th
  • Conference_Location
    San Diego, CA
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4244-4475-5
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2009.5074148
  • Filename
    5074148