Multi-scale analysis and design of nano imprint process

Nanometer-sized structures are being applied to many fields including micro/nano electronics, optoelectronics, quantum computing, biosensors, etc. Nano imprint technology is one of the most promising methods for manufacturing the nanometer-sized structures. The crucial element for the nano imprint technology is the nano-resolution printing technique using polymeric stamps. In this study, a multi-scale analysis scheme for simulating the nano imprint process is proposed and some useful results are presented. Using the slip-link model, the dependency of viscoelasticity on molecular weight of polymer stamp is predicted. Deformation behaviors of polymeric stamps are analyzed by finite element method based upon the predicted viscoelastic properties. The obtained results can be used to design the nano imprint process.