• DocumentCode
    2103549
  • Title

    Performance analysis of an asymmetric metal semiconductor metal photodetector

  • Author

    Tripathi, Rahul ; Baghel, Paritosh Singh ; Chauhan, R.K.

  • Author_Institution
    Dept. of Electron. & Commun. Eng., Madan Mohan Malaviya Eng. Coll., Gorakhpur
  • fYear
    2008
  • fDate
    22-24 Dec. 2008
  • Firstpage
    197
  • Lastpage
    200
  • Abstract
    Photodetectors are used in many applications of everyday life. Among the available photodetectors, MSM photodetectors are preferred as they provide good electrical bandwidth, fast response, small capacitance, a large active area and are easy to fabricate. MSM photodetectors have low quantum efficiencies and high dark current as compared to other available commercial photodetectors, which can further be improved. In this work, it has been shown that the. NPDR (normalized photocurrent to dark current ratio) of MSM photodetectors could be raised further with the incorporation of different metals to provide higher asymmetry. Asymmetric MSM-PD is used to suppress the dark current further by modifying the schottky barrier heights preferentially. The plots of NPDR for different metals on silicon substrate are compared and the Ti-SiGe-Ni structure has been shown to have better NPDR than other MSM Structures.
  • Keywords
    Ge-Si alloys; Schottky barriers; chromium; elemental semiconductors; metal-semiconductor-metal structures; nickel; photoconductivity; photodetectors; semiconductor-metal boundaries; silicon; titanium; Cr-SiGe-Si-Cr; Cr-SiGe-Si-Ni; Cr-SiGe-Si-Ti; Ni-SiGe-Si-Cr; Ni-SiGe-Si-Ni; Ni-SiGe-Si-Ti; Schottky barrier heights; Ti-SiGe-Si-Cr; Ti-SiGe-Si-Ni; Ti-SiGe-Si-Ti; asymmetric metal-semiconductor-metal photodetector; dark current suppression; heterojunction photodetectors; photocurrent; silicon substrate; Charge carrier processes; Dark current; Heterojunctions; III-V semiconductor materials; Optical fiber communication; Performance analysis; Photoconductivity; Photodetectors; Schottky barriers; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Optoelectronic Materials and Devices, 2008. AOMD 2008. 2nd National Workshop on
  • Conference_Location
    Varanasi
  • Print_ISBN
    978-0-230-63718-4
  • Type

    conf

  • Filename
    5075706