Real-time control of reactive ion etching: identification and disturbance rejection

Author

Rashap, B.A. ; Khargonekar, P.P. ; Grizzle, J.W. ; Elta, M.E. ; Freudenberg, J.S. ; Terry, E.L., Jr.

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA

fYear

1993

fDate

15-17 Dec 1993

Firstpage

3379

Abstract

The main processes involved in the manufacture of integrated circuits are deposition, lithography, etching, and implantation. This paper describes results on identification and real-time control of reactive ion etchers. Experimental results show that significant disturbances to the etch rate can be attenuated with real-time feedback control

Keywords

feedback; identification; integrated circuit manufacture; process computer control; process control; real-time systems; sputter etching; disturbance rejection; etch rate; identification; integrated circuits; reactive ion etching; real-time feedback control; Etching; Feedback control; Laboratories; Manufacturing processes; Open loop systems; PD control; Pi control; Plasma applications; Pressure control; Weight control;

fLanguage

English

Publisher

ieee

Conference_Titel

Decision and Control, 1993., Proceedings of the 32nd IEEE Conference on

Conference_Location

San Antonio, TX

Print_ISBN

0-7803-1298-8

Type

conf

DOI

10.1109/CDC.1993.325839

Filename

325839

Link To Document

https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2113004