DocumentCode
2123013
Title
Application of self-assembled InAs nanodots for a HEMT-type memory-effect transistor
Author
Koike, K. ; Li, S. ; Saitoh, K. ; Sasa, S. ; Inoue, M. ; Yano, M.
Author_Institution
New Mater. Res. Center, Osaka Inst. of Technol., Japan
fYear
2000
fDate
2000
Firstpage
106
Lastpage
109
Abstract
This letter describes an application of InAs nanodots embedded in an Al0.5Ga0.5As for a memory-effect field-effect transistor. The device experiences a shift of threshold gate voltage as a function of the amount of electrons in the nanodots. Although this shift volatilizes with the time after memory programming operation, a considerable part of the shift is retained more than 100 h even at room temperature
Keywords
III-V semiconductors; high electron mobility transistors; indium compounds; self-assembly; semiconductor quantum dots; semiconductor storage; Al0.5Ga0.5As; Al0.5Ga0.5As barrier layer; HEMT; InAs; InAs self-assembled nanodots; memory effect field effect transistor; threshold voltage; Electrodes; Electrons; Excitons; FETs; Gallium arsenide; HEMTs; Nanoscale devices; Self-assembly; Temperature dependence; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2000. Conference Proceedings. 2000 International Conference on
Conference_Location
Williamsburg, VA
ISSN
1092-8669
Print_ISBN
0-7803-6320-5
Type
conf
DOI
10.1109/ICIPRM.2000.850243
Filename
850243
Link To Document