• DocumentCode
    2145044
  • Title

    High temperature synthesis of In-doped ZnO nano-structures on InP (001) substrate by pulsed laser deposition

  • Author

    Yu, Dongqi ; Li, Jiao ; Hu, Lizhong ; Hu, Hao ; Zhang, Heqiu ; Qiang, Fu ; Xi, Chen

  • Author_Institution
    Sch. of Phys. & Optoelectron. Technol., Dalian Univ. of Technol., Dalian, China
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    596
  • Lastpage
    599
  • Abstract
    ZnO nanostructures were grown on InP (001) substrate to achieve the In-doped ZnO nanostructure by pulsed laser deposition technique at high temperature. The FE-SEM images showed that the nanostructures grown at different temperatures have distinct dissimilar structures, and the morphology became better with increasing substrate temperature. The results of XRD showed that In element from InP substrates diffused into the ZnO layer to form In-doped ZnO nanostructures at the high temperature above 500°C. Energy dispersive chemical analysis (EDAX) is taken to ascertain the component of the nanostructure grown.
  • Keywords
    II-VI semiconductors; III-V semiconductors; X-ray chemical analysis; X-ray diffraction; indium compounds; nanofabrication; nanostructured materials; pulsed laser deposition; scanning electron microscopy; surface morphology; wide band gap semiconductors; zinc compounds; EDAX; FE-SEM images; InP; XRD; ZnO:In; energy dispersive chemical analysis; high temperature synthesis; indium-doped zinc oxide nanostructure growth; pulsed laser deposition; substrate temperature; surface morphology; Chemical elements; Dispersion; Indium phosphide; Morphology; Nanostructures; Optical pulses; Pulsed laser deposition; Temperature; X-ray scattering; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734609
  • Filename
    4734609